15 août 1991
Ce document est lié à :
http://archipel.uqam.ca/7793/
Ce document est lié à :
http://dx.doi.org/10.1063/1.349431
Ce document est lié à :
doi:10.1063/1.349431
C. Lavoie et al., « Profile of titanium lines produced by excimer laser direct writing on lithium niobate », UQAM Archipel : articles scientifiques, ID : 10670/1.do20re
The profile of titanium (Ti) lines produced by KrF excimer laser direct writing on lithium niobate (LiNb03) has been investigated in detail since it is critical in the fabrication of Ti in-diffused LiNbOs optical waveguides. Lines written at speeds varying from 0.5 to 10 um/s have typical thicknesses and linewidths varying from 10 to 185 nm and from 2 to 24 pm, respectively. At a low power density E, the maximum thickness t is proportional to the number of photons or the power density. Increasing E allows a sufficient heating, which leads to the diffusion of Ti into LiNbOs, resulting in a sharp decrease of the thickness in the middle of the deposited line.